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Response to “Comment on ‘Low level plasma formation in a carbon velvet cesium iodide coated cathode’ ” [Phys. Plasmas11, 5730 (2004)]

D. Shiffler, J. Heggemeier, M. LaCour, K. Golby, M. Ruebush2004年Physics of PlasmasIF 2.2 出版社

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Plasma formation

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