FusionPapers
図版検索AI要約wiki日本の研究装置ジャーナルChatGPTAbout
© 2026 FUSIONPAPERS
About法務情報
トップに戻る

A simple method to deposit palladium dopedSnO2thin films using plasma enhanced chemical vapor deposition technique

Young Soon Kim, S. G. Ansari, Z. A. Ansari, Rizwan Wahab, Hyung-Shik Shin2010年Review of Scientific InstrumentsIF 1.6出版社
この論文にはまだAI要約がありません。

関連論文

Development of plasma assisted thermal vapor deposition technique for high-quality thin film

2016Review of Scientific Instruments

Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition

2016Physics of Plasmas

Hybrid radio-frequency/direct-current plasma-enhanced chemical vapor deposition system for deposition on inner surfaces of polyethylene terephthalate bottles

2009Review of Scientific Instruments

A cold plasma deposition of mixed tungsten and cobalt oxides-based thin films

2025Plasma Physics and Controlled Fusion