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New method for thin-film formation with cryogenic diode and cryogenic target

Koichi Kasuya, Hitoshi Okayama, Masato Watanabe1999年Fusion Engineering and DesignIF 1.7出版社

AbstractIn this paper we propose a new method to produce thin films by the irradiation of targets using focused ion beams. The starting point is to use the cryogenic targets with or without cryogenic ion diodes. As a first trial, we built a cryogenic target which was cooled by liquid nitrogen and we irradiated the ice-covered target by proton beams. We measured the luminosity of the ablated region to investigate the fundamental processes concerned. The preliminary results are shown here.

日本語訳

本論文では、集束イオンビームによるターゲットの照射を用いて薄膜を生成する新しい方法を提案する。出発点は、極低温イオンダイオードの有無にかかわらず極低温ターゲットを使用することである。最初の試行として、液体窒素で冷却した極低温ターゲットを構築し、氷で覆われたターゲットに陽子ビームを照射した。我々は、関連する基本的なプロセスを調査するために、アブレーション領域の光度を測定した。予備的な結果をここに示す。

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