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A large anisotropy of the electron distribution function in plasma production with prepulse-controlled high power KrF laser

Hitoki Yoneda, Noboru Hasegawa, Shu-ichi Kawana, Ken-ichi Ueda1999年Fusion Engineering and DesignIF 1.7出版社

AbstractA large anisotropy of the electron distribution function (EDF) was observed in high density plasma. The plasma was created by a 2-ps TW KrF laser system in which a prepulse energy was well controlled with a saturable absorber. The observed electron density at the emission area with He-like F ions was 0.7–1.5×1022 cm−3. A 90° deflection time by electron-ion collisions was calculated to be two orders of magnitude smaller than the laser pulse duration. Even with this high collisionality, the anisotropy of EDF was driven by the laser field and was maintained. That means the anisotropy will become a parameter instead of temperature in the high density plasma which was far from the equilibrium state. The energy transfer process will be discussed with these new measurements in future.

日本語訳

高密度プラズマ中で電子分布関数(EDF)の大きな異方性が観測された。このプラズマは、2 psのTW KrFレーザーシステムによって生成され、その中でプリパルスエネルギーは可飽和吸収体により良好に制御された。He様Fイオンを有する発光領域における観測された電子密度は0.7–1.5×10^23 cm⁻³であった。電子-イオン衝突による90度偏向時間は、レーザーパルス持続時間よりも2桁小さいと計算された。この高い衝突頻度にもかかわらず、EDFの異方性はレーザーによって駆動され、維持された。これは、平衡状態から遠く離れた高密度プラズマにおいて、異方性が温度の代わりにパラメータとなることを意味する。エネルギー移動過程については、これらの新しい測定結果を用いて今後議論される予定である。

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