The author presents examples of high-power RF applications covering a frequency range of a few MHz up to microwave frequencies of several GHz. All examples refer to the RF generation of nonfusion plasmas meanwhile for many important technical processes. Some specific items are: inductively driven RF discharge for ion beam extraction (for space propulsion, ion surface treatment and ion implantation), RF-plate reactor (for etching and thin-film deposition in microelectronics), and newly developed microwave plasma sources (ECH discharges for large-area coatings of up to 200 m2/h, or for internal coating of pipes.