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Grain growth in processing plasmas

V W Chow, D A Mendis, M Rosenberg2000年Plasma Physics and Controlled FusionIF 2.2出版社

In this paper we revisit the problem of grain growth in processing plasmas, recently reviewed by Watanabe (1997). In our model we include the effect of grain size dependence on secondary electron emission. We find that the secondary emission from the grains due to energetic -electrons from the negatively biased electrode cannot alone produce grains of opposite polarity (i.e. the smaller grains are positively charged and the larger grains are negatively charged), but could do so if additionally there is electron depletion. While electron depletion occurs in the sheath due to its negative potential, it can also occur at the sheath edge due to absorption by the large population of dust grains. Additionally, we note that even at the sheath edge stochastic heating of the smaller grains by energetic -electrons leading to stochastic thermionic emission could also lead to a small fraction of very small grains to be positive at any time.

日本語訳

本論文では、処理プラズマにおける粒子成長の問題を再検討する。この問題は、最近Watanabe(1997)によって総説がまとめられている。我々のモデルでは、二次電子放出に対する粒子サイズ依存性の影響を含めている。我々は、負にバイアスされた電極からの高エネルギー電子による粒子からの二次電子放出は、それ単独では逆極性の粒子(すなわち、より小さい粒子が正に帯電し、より大きい粒子が負に帯電する状態)を生み出すことはできないが、電子枯渇が追加的に生じる場合にはその可能性があることを見いだした。電子枯渇は、シース内ではその負の電位によって生じるが、シース端では、多数のダスト粒子による吸収によっても生じ得る。さらに、シース端においても、高エネルギー電子によるより小さい粒子の確率的加熱が確率的熱電子放出をもたらし、これにより、任意の時点でごく小さな粒子の一部が正に帯電する可能性があることにも留意する。

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