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High-quality 5 GeV electron bunches with resonant multi-pulse ionization injection

P Tomassini, D Terzani, F Baffigi, F Brandi, L Fulgentini, P Koester, L Labate, D Palla, L A Gizzi2020年Plasma Physics and Controlled FusionIF 2.2出版社

The production of high-quality electron bunches in laser wakefield acceleration relies on the possibility of injecting ultra-low emittance bunches in the plasma wave. A new bunch injection scheme (resonant multi-pulse ionization, ReMPI) has been conceived and studied, in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. Such a train of pulses can be obtained in a very efficient, compact and stable way, by phase manipulation in the laser front-end. The ReMPI injection scheme relies on currently available laser technology and is being considered for the implementation of future compact x-ray free electron laser schemes. Simulations show that high-quality electron bunches with an energy of up to 5 GeV and a peak current exceeding 2 kA, with normalized emittance of below 0.1 mm × mrad and a slice energy spread of below 0.1%, can be obtained with a single stage.

日本語訳

レーザー航跡場加速における高品質電子バンチの生成は、プラズマ波中への超低エミッタンスバンチの入射可能性に依存している。新しいバンチ入射方式(共鳴多パルス電離、ReMPI)が考案され、研究された。これは、共鳴的超短パルス列によって駆動される大振幅プラズマ波に、電離によって取り出された電子が捕捉される方式である。このようなパルス列は、レーザーフロントエンドにおける位相操作によって、非常に効率的かつコンパクトに、そして安定に得ることができる。ReMPI入射方式は、現在利用可能なレーザー技術に依存しており、将来のコンパクトなX線自由電子レーザースキームの実装に向けて検討されている。シミュレーションにより、エネルギーが最大5 GeV、ピーク電流が2 kAを超え、規格化エミッタンスが0.1 mm×mrad未満、スライスエネルギー広がりが0.1%未満の高品質電子バンチが、単一ステージで得られることが示されている。

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