FusionPapers
図版検索AI要約wiki日本の研究装置ジャーナルChatGPTAbout
© 2026 FUSIONPAPERS
About法務情報
トップに戻る

Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining

Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori2005年Review of Scientific InstrumentsIF 1.6出版社
この論文にはまだAI要約がありません。

関連論文

Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining

2004Review of Scientific Instruments

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

2016Review of Scientific Instruments

Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons

2023Review of Scientific Instruments

High-precision finishing method for narrow-groove channel-cut crystal x-ray monochromator using plasma chemical vaporization machining with wire electrode

2024Review of Scientific Instruments

Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining

2007Review of Scientific Instruments

On plasma crystal formation

1996Physics of Plasmas

Plasma processing and chemistry

1994Plasma Physics and Controlled Fusion