FusionPapers
図版検索AI要約wiki日本の研究装置ジャーナルChatGPTAbout
© 2026 FUSIONPAPERS
About法務情報
トップに戻る

Cluster-eliminating filter for depositing cluster-freea-Si:H films by plasma chemical vapor deposition

Kazunori Koga, Naoto Kaguchi, Kouki Bando, Masaharu Shiratani, Yukio Watanabe2005年Review of Scientific InstrumentsIF 1.6出版社
この論文にはまだAI要約がありません。

関連論文

Optical properties of cluster plasma

1999Physics of Plasmas

Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency plasma enhanced chemical vapor deposition

2016Physics of Plasmas

Dynamics of isotropic and drifting plasmas in the vicinity and within two-dimensional finite dust clusters

2012Plasma Physics and Controlled Fusion

An evaporation model for H2-clusters interacting with electrons and ions in a plasma

1974Nuclear Fusion