Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities
H. Koivisto, T. Kalvas, O. Tarvainen, J. Komppula, J. Laulainen, R. Kronholm, K. Ranttila, J. Tuunanen, T. Thuillier, D. Xie, G. Machicoane2016年Review of Scientific InstrumentsIF 1.6出版社
