FusionPapers
図版検索トレンドwiki日本の研究
© 2026 FUSIONPAPERS
About法務情報
トップに戻る

A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications: Numerical investigation by fluid model

Banat Gul, Aman-ur-Rehman2015年Physics of PlasmasIF 2.2出版社

wiki

Capacitively coupled plasma
この論文にはまだAI要約がありません。

関連論文

Numerical study of capacitive coupled HBr/Cl2plasma discharge for dry etch applications

2016Physics of Plasmas

A numerical study of the effect of various reactions, pressure and gas mixture ratio on the density distribution of etchant species (H, Br, Br+, and HBr+) in HBr/He plasma

2016Physics of Plasmas

Investigation of active species in low-pressure capacitively coupled N2/Ar plasmas

2021Physics of Plasmas