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Initial results of RFP experiments in REPUTE-1

N Asakura, T Fujita, K Hattori, N Inoue, S Ishida, Y Kamada, S Matsuzuka, K Miyamoto, J Morikawa, Y Nagayama1986年Plasma Physics and Controlled FusionIF 2.2出版社

Experiments of a reversed field pinch device REPUTE-1 constructed in University of Tokyo started in 1984. The conductivity electron temperature and the line-averaged electron density increase approximately linearly with the increase of plasma current in the range up to 240 kA. The study of the effect of the bias toroidal field on the discharge characteristics shows that a higher bias field gives lower resistivity and a higher flat top plasma current. The toroidal flux at the current flat top tends to be a selective value independent of the initial bias field.

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Reversed field pinch
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