Despite the low solubility of hydrogen isotopes (HIs) in tungsten (W), their concentration can reach up to ∼10 at.% after low-energy plasma irradiation. This is generally attributed to the vacancies that may accommodate excessive HIs. However, the kinetic energy of incident HIs transferred to W is far below the energy threshold to create a Frenkel pair, the underlying mechanism of defect production is still unclear. Here, we investigate the influence of H on the defect production in W using the molecular dynamic (MD) simulations. It is found that the threshold displacement energy (TDE) in bulk W slight decreases with the increasing of H concentration. This is due to the formation of H-vacancy complexes, which prevents the vacancy-interstitial recombination. More importantly, the H effects are significantly magnified in the surface region. On the one hand, the maximum kinetic energy transferred from 400 eV H to W can reach up to ∼21 eV due to the double-hit process, which is two times higher than that predicted by elastic collision model. On the other hand, the momentum transferred to W is completely random, including both the recoil direction upward and downward from the surface. Accordingly, the lowest TDE in W surface is only 15–21 eV at sub-surface layers with the depth of 6.7–11.1 Å, which is lower than the maximum kinetic energy transferred to W. Therefore, the low-energy HIs irradiation can create the defects in W surface directly. Our findings provide deep insight into defect production in W at sub-threshold energy and have wider implications for materials performance under low-energy ions irradiation.
This paper investigates how hydrogen affects defect formation in tungsten under low-energy irradiation. It finds that hydrogen can lower the energy threshold for creating defects, especially near the surface, where the momentum transfer from hydrogen can be high enough to directly displace tungsten atoms. This provides insights into how materials perform under low-energy ion bombardment.