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Stress analysis around DSCu/SS316 HIP bonded interface

S Kikuchi, Y Nomura, M Saito2001年Fusion Engineering and DesignIF 1.7出版社

AbstractHIP bonded structure of DSCu/SS316 is proposed for ITER plasma facing components. In 20th SOFT, we reported the fracture strength of HIP bonded interface at ambient temperature. But first wall is at high temperature in operation, we estimate in this study the fracture strength of HIP bonded interface at 473K as a first step of high temperature. The results of fracture strength test indicate that the fracture strength of HIP bonded interface at high temperature is lower than that at ambient temperature. The fracture surfaces of specimens ruptured at ambient temperature and at 473K were observed. Crack surfaces were nearly 10 μm apart from the bonded interface into DSCu side. Scanning electron microscope observation is considered to show the existence of the thin new layer in DSCu region in which the dispersed Al2O3 was diminished. Assuming the thin layer to be composed of Cu, fracture behavior of HIP bonded structure is simulated by three layers model DSCu/Cu/SS316 and the fracture strength is estimated by the stress intensity factor K. The analytical results conclude that crack propagates in DSCu/Cu interface more easily, which is good agreement with fracture surface in experiments.

日本語訳

Abstract ITERのプラズマ対向機器用に、DSCu/SS316のHIP接合構造が提案されている。第20回SOFTにおいて、我々は室温におけるHIP接合界面の破壊強度を報告した。しかしながら、第一壁は運転中高温になるため、本研究では高温特性の第一段階として473KにおけるHIP接合界面の破壊強度を評価した。破壊強度試験の結果から、高温におけるHIP接合界面の破壊強度は室温のそれよりも低いことが示された。室温および473Kで破断した試験片の破面を観察した。き裂面は接合界面からDSCu側に約10μmの位置にあった。走査型電子顕微鏡観察により、分散したAl2O3が減少したDSCu領域に薄い新層の存在が示された。この薄層がCuで構成されていると仮定し、HIP接合構造の破壊挙動をDSCu/Cu/SS316の3層モデルでシミュレーションし、応力拡大係数Kによって破壊強度を評価した。解析結果から、き裂はDSCu/Cu界面を伝播しやすいことが示され、これは実験における破面とよく一致した。

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