図版検索トレンド wiki 日本の研究

© 2026 FUSIONPAPERS

About 法務情報

トップに戻る

Three-dimensional measurements of plasma parameters in an inductively coupled plasma processing chamber

Jia Han, Patrick Pribyl, Walter Gekelman, Alex Paterson, Steven J. Lanham, Chenhui Qu, Mark J. Kushner2019年Physics of PlasmasIF 2.2 出版社

wiki

Inductively coupled plasma

この論文にはまだAI要約がありません。

関連論文

Plasma parameters analysis of various mixed gas inductively coupled plasmas

2002Physics of Plasmas

Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

2024Physics of Plasmas

On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

2014Physics of Plasmas

A study on plasma parameters in Ar/SF6inductively coupled plasma

2017Physics of Plasmas

Improving plasma uniformity in the inductively coupled plasma by external magnetic field

2024Physics of Plasmas

Inductively coupled plasma heating in a weakly magnetized plasma

1999Physics of Plasmas

Experimental investigation on optimal plasma generation in inductively coupled plasma

2021Physics of Plasmas

On a dual inductively coupled plasma for direct and remote plasma in a reactor

2004Physics of Plasmas

Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma

2015Physics of Plasmas

Influence of heat and particle fluxes nonlocality on spatial distribution of plasma density in two-chamber inductively coupled plasma sources

2012Physics of Plasmas