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Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

Seolhye Park, Yoona Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ki-baek Roh, Rabul Seo, Bongsub Song, Gon-Ho Kim2024年7月Physics of PlasmasIF 2.2 出版社

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Inductively coupled plasma Plasma heating

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