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The opposite pressure dependence of electron temperature with respect to O2/Ar mixing ratio in an inductively coupled plasma

Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Deuk-Chul Kwon, Chin-Wook Chung2020年Physics of PlasmasIF 2.2出版社

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Inductively coupled plasma
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