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Discharge physics and atomic layer etching in Ar/C4F6inductively coupled plasmas with a radio frequency bias

Min Young Yoon, H. J. Yeom, Jung Hyung Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong, Hyo-Chang Lee2021年Physics of PlasmasIF 2.2 出版社

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Inductively coupled plasma

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