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Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments

Z Donkó, J Schulze, U Czarnetzki, A Derzsi, P Hartmann, I Korolov, E Schüngel2012年Plasma Physics and Controlled FusionIF 2.2出版社

Capacitive radio frequency (RF) discharge plasmas have been serving hi-tech industry (e.g. chip and solar cell manufacturing, realization of biocompatible surfaces) for several years. Nonetheless, their complex modes of operation are not fully understood and represent topics of high interest. The understanding of these phenomena is aided by modern diagnostic techniques and computer simulations. From the industrial point of view the control of ion properties is of particular interest; possibilities of independent control of the ion flux and the ion energy have been utilized via excitation of the discharges with multiple frequencies. 'Classical' dual-frequency (DF) discharges (where two significantly different driving frequencies are used), as well as discharges driven by a base frequency and its higher harmonic(s) have been analyzed thoroughly. It has been recognized that the second solution results in an electrically induced asymmetry (electrical asymmetry effect), which provides the basis for the control of the mean ion energy. This paper reviews recent advances on studies of the different electron heating mechanisms, on the possibilities of the separate control of ion energy and ion flux in DF discharges, on the effects of secondary electrons, as well as on the non-linear behavior (self-generated resonant current oscillations) of capacitive RF plasmas. The work is based on a synergistic approach of theoretical modeling, experiments and kinetic simulations based on the particle-in-cell approach.

日本語訳

容量性高周波(RF)放電プラズマは、数年にわたりハイテク産業(例えば、チップや太陽電池の製造、生体適合性表面の実現)に貢献してきた。しかしながら、その複雑な動作モードは完全には理解されておらず、高い関心の対象となっている。これらの現象の理解は、最新の診断技術とコンピュータシミュレーションによって促進されている。産業的な観点からは、イオン特性の制御が特に重要であり、複数の周波数による放電励起を通じて、イオンフラックスとイオンエネルギーの独立した制御の可能性が活用されてきた。従来の二周波(DF)放電(2つの大きく異なる駆動周波数を用いるもの)と同様に、基本周波数とその高調波によって駆動される放電も詳細に分析されている。後者の方法は、電気的に誘起される非対称性(電気的非対称効果)をもたらすことが認識されており、これが平均イオンエネルギー制御の基盤を提供する。本論文は、DF放電における異なる電子加熱メカニズムの研究、イオンエネルギーとイオンフラックスの分離制御の可能性、二次電子の影響、ならびに容量性RFプラズマの非線形挙動(自己生成共鳴電流振動)に関する最近の進展をレビューする。この研究は、理論モデリング、実験、および粒子インセル法に基づく運動論的シミュレーションの相乗的アプローチに基づいている。

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