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Deuterium supersaturated surface layer in tungsten: ion energy dependence

D. Nishijima, M. Tokitani, D. Nagata, T. Schwarz-Selinger, A. Založnik, F. Chang, R.P. Doerner, M.I. Patino, M.J. Simmonds, M.J. Baldwin2023年Nuclear FusionIF 3出版社

Properties of deuterium (D) supersaturated surface layers (DSSLs) formed in tungsten (W), such as thickness, internal microstructures, and D retention, are experimentally investigated as a function of the incident ion energy, Ei. W samples were exposed to D plasmas in the PISCES-A linear plasma device in a range of Ei ∼ 45–175 eV, while other plasma exposure parameters were fixed: sample temperature, Ts, ∼423 K, ion flux, Γi, ∼1.2 × 1021 m−2s−1, and fluence, Φi, ∼3.0 × 1024 m−2. High-resolution, cross-sectional, transmission electron microscopy observations confirm that (1) a DSSL forms even at the lowest Ei ∼ 45 eV, (2) the DSSL thickness, ΔtDSSL, is found to decrease with decreasing Ei from ∼11–12 nm at Ei ∼ 175 eV to ∼5–6 nm at ∼45 eV, and to agree with approximately the maximum implantation depth calculated using SDTrimSP, and (3) high-density D nanobubbles with a diameter of ∼1 nm or less exist inside the DSSL, which is deemed to validate a theory-predicted vacancy stabilization process due to trapping of a solute D atom(s). Utilizing a D areal density of ∼4.2 × 1019 m−2 in the first 14 nm from the surface at Ei ∼ 75 eV from nuclear reaction analysis and the measured Ei dependence of ΔtDSSL, our previous laser-induced breakdown spectroscopy data is updated: both dynamic and static D retention increase with decreasing Ei, and the D/W atomic fraction during plasma exposure reaches ∼0.3 at Ei ∼ 45 eV. A possible DSSL formation mechanism is proposed.

日本語訳

タングステン(W)中に形成される重水素(D)過飽和表面層(DSSLs)の特性、例えば厚さ、内部微細構造、D保持量は、入射イオンエネルギーEiの関数として実験的に調査される。W試料は、PISCES-A線形プラズマ装置において、Ei ∼ 45–175 eVの範囲のDプラズマに曝露された。一方、他のプラズマ曝露パラメータは固定された: 試料温度Ts ∼423 K、イオンフラックスΓi ∼1.2 × 1021 m−2s−1、フルエンスΦi ∼3.0 × 1024 m−2。高分解能断面透過型電子顕微鏡観察により、(1)最も低いEi ∼ 45 eVでもDSSLが形成されること、(2)DSSL厚さΔtDSSLは、Eiの減少とともにEi ∼ 175 eVでの約11–12 nmから∼45 eVでの約5–6 nmへ減少し、SDTrimSPを用いて計算された最大注入深さと概ね一致すること、(3)DSSL内部には直径約1 nm以下の高密度のDナノバブルが存在し、これは溶質D原子の捕捉による理論予測された空孔安定化過程を検証するものとみなされること、が確認された。核反応分析からのEi ∼ 75 eVにおける表面から最初の14 nm内のD面密度 ∼4.2 × 1019 m−2 と、測定されたΔtDSSLのEi依存性を用いて、我々の以前のレーザー誘起絶縁破壊分光法データは更新される: 動的および静的なD保持量はともにEiの減少とともに増加し、プラズマ曝露中のD/W原子比はEi ∼ 45 eVで約0.3に達する。可能性のあるDSSL形成機構が提案される。

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