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Laser wakefield accelerator driven by the super-Gaussian laser beam in the focus

Dominika Maslarova, Miroslav Krus, Vojtech Horny, Jan Psikal2020年Plasma Physics and Controlled FusionIF 2.2出版社

The injection process is one of the most crucial attributes that determine the final properties of the electron bunch in laser wakefield accelerators. Here, a new injection method is proposed and studied via particle-in-cell simulations for the typical parameters of the bubble regime. The injection is triggered by the laser beam that reaches the super-Gaussian profile in the focus. Such a beam undergoes rapid variations in its intensity distribution during the diffraction process. If this diffraction occurs in underdense plasma, consequent changes in the bubble structure activate a localized transverse injection process. The generated electron bunch is characterized by the short duration (∼2 fs) and low transverse emittance (≤1 mm mrad) while maintaining relatively high charge (∼0.2 nC).

日本語訳

レーザー航跡場加速器における電子バンチの最終的な特性を決定する最も重要な要素の一つが、入射過程である。本論文では、バブル領域の典型的なパラメータに対して、粒子セルシミュレーションを用いて新しい入射方法を提案し、検証する。この入射は、焦点において超ガウス分布に達したレーザービームによって誘起される。このようなビームは、回折過程においてその強度分布が急速に変化する。この回折が低密度プラズマ中で生じると、その結果として生じるバブル構造の変化が、局所的な横方向入射を活性化する。生成される電子バンチは、比較的高い電荷量(約0.2 nC)を維持しつつ、短いパルス幅(約2 fs)と低い横方向エミッタンス(≤1 mm mrad)を特徴とする。

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Plasma focusWakefield accelerationLaser wakefield
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