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Negative ions for heavy ion fusion and semiconductor manufacturing applications

S. K. Hahto, S. T. Hahto, J. W. Kwan, K. N. Leung, L. R. Grisham, K. Saadatmand, V. Benveniste2004年Review of Scientific InstrumentsIF 1.6出版社

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Negative ionHeavy ion fusion
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