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Ion cyclotron range of frequencies plasma production and heating in the large helical device

V. E. Moiseenko, Yu. V. Kovtun, H. Kasahara, T. Seki, K. Saito, R. Seki, S. Kamio, A. Dinklage, D. Hartmann, H. Laqua, T. Stange, S. Lazerson, A. Alonso, T. Wauters, Ye. O. Kazakov, J. Ongena, I. E. Garkusha2025年3月Physics of PlasmasIF 2.2 出版社

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Ion cyclotron heating Helical device

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