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Plasma heating characterized PI (plasma information) index for large-area capacitively coupled RF discharges in the mass production systemOpen Access

Seolhye Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ji-Won Kwon, Gon-Ho Kim2025年8月Physics of PlasmasIF 2.2 出版社

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Plasma heating Capacitively coupled plasma

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