AbstractIPP Garching has been developing a RF ion source for H− production. In order to improve the data quality a new scanning probe system with passive RF compensation has been installed on the Type VI ion source on the BATMAN test stand. Using this probe, measurements have been carried out to study changes to the plasma parameters (electron density, electron temperature, and plasma potential) due to variation in the source operating conditions. The data were collected at a source pressure of 0.5 Pa and with 60±5 kW applied RF power. Presented are some of the results of these measurements, focusing on the effect of: argon seeding, addition of Cs to the source, and the newly added Faraday screen. The electron density behaves in a fashion that agrees with the theory of ambipolar diffusion. Typically there is little change to the average electron energy observed regardless of which effect is considered. The plasma potential shows the most significant changes with external source conditions, both in value for all cases and shape when the Faraday screen was added.