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A proposal for both plasma ion- and electron-temperature diagnostics under simultaneous incidence of particles and x-rays into a semiconductor on the basis of a proposed model for a semiconductor detector response

T Numakura, T Cho, J Kohagura, M Hirata, R Minami, M Yoshida, Y Nakashima, T Tamano, K Yatsu, S Miyoshi2003年Plasma Physics and Controlled FusionIF 2.2出版社

A method is proposed for obtaining radial profiles of plasma temperatures of both plasma ion (Ti) and electron (Te) simultaneously by the use of a semiconductor detector array. The method is based on our developed particle-response model for a semiconductor detector; in particular, the response theory is constructed for giving the applicability in particle energies ranging down to a kiloelectronvolt. Calculated results from our model are in fairly good agreement with experimental data on the detector response of incident particle beams with energies in the range 100 eV to a few kiloelectronvolts. On the basis of the verification of the proposed model, an idea of the use of a developed semiconductor detector array covered with `reliably unbreakable' ultrathin SiO2 `dead-layer filters' having various nanometre-order thicknesses is applied for simultaneous Ti and Te analyses by using charge-exchange neutral particles and x-rays from plasmas. Radial profiles of Ti and Te are obtained in a single plasma discharge alone, and the data reliability is independently cross-checked by a radial scan of a conventional charge-exchange neutral-particle analyser system as well as a 50-channel microchannel plate x-ray diagnostics system in the GAMMA 10 tandem mirror.

日本語訳

半導体検出器アレイを用いて、プラズマのイオン温度(Ti)と電子温度(Te)の両方の動径分布を同時に取得する方法を提案する。本手法は、我々が開発した半導体検出器の粒子応答モデルに基づくものである。特に、この応答理論は、粒子エネルギーが100 eV程度の低エネルギー領域まで適用可能となるよう構築されている。本モデルによる計算結果は、100 eVから数keVの範囲の入射粒子ビームに対する検出器応答の実験データと良好な一致を示す。提案モデルの検証に基づき、数ナノメートルオーダーの厚さを有する「信頼性の高い極薄SiO2デッド層」で被覆した半導体検出器アレイを用いることで、プラズマからの荷電交換中性粒子とX線を同時に計測し、TiとTeの同時解析を行う手法を適用する。GAMMA 10タンデムミラー装置において、単一プラズマ放電のみでTiおよびTeの動径分布を取得し、その信頼性は、従来型の荷電交換中性粒子分析装置システムおよび50チャンネルマイクロチャンネルプレートX線診断システムによる動径走査測定との比較により独立に検証された。

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