Plasma processing forms an invaluable part of semiconductor devicemanufacturing. For the most part, commercial tools have relied on an empiricalprocess for their evolution and relied exclusively on plasma characterizationonly at the development stage. As this industry advances there is the need toprovide non-invasive plasma characterization and diagnostics on the processingequipment, in order to provide more control over the plasma properties. Weoutline some of the typical configurations used in the industry and describetwo of the measurement techniques we have developed for the characterizationof these industrial plasma sources.