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Hybrid simulations of fast electron propagation including magnetized transport and non-local effects in the background plasma

B E R Williams, R J Kingham2013年Plasma Physics and Controlled FusionIF 2.2出版社

We present the first results from a 2D VFP-PIC hybrid code for fast electron transport which solves the Vlasov–Fokker–Planck (VFP) equation for the background electrons using the code IMPACT. This new type of hybrid code captures full Braginskii electron transport including magnetization, non-local corrections and electron inertial effects. We consider propagation of a relativistic electron beam, generated by a laser of intensity I = (1–5) × 1019 W cm−2 and focal radius of a few microns, inside a near solid-density carbon target. Electron thermal transport out of the resistively heated background plasma is strong enough to compete with ohmic heating after about a picosecond. The effect of heat flow on the plasma temperature is sufficient to alter resistive magnetic field generation over time scales beyond a few picoseconds. This includes removal of beam-hollowing field near the beam injection point and re-emergence of a collimating magnetic field. Background electrons become weakly magnetized after a few picoseconds; enough for magnetized transport effects to significantly alter the evolution of the background plasma temperature and the long term evolution of the fast electron filaments. A practical estimate for the evolution of electron magnetization is presented and shown to agree with the simulation results. Non-local modifications to transport of up to 20% have been found in this situation.

日本語訳

2D Vlasov–Fokker–Planck(VFP)ハイブリッドコードを用いた高速電子輸送の最初の結果を提示する。このコードは、背景電子に対してVlasov–Fokker–Planck方程式をコードIMPACKを用いて解くものである。この新しいタイプのハイブリッドコードは、磁化、非局所補正、電子慣性効果を含む完全なBraginskii電子輸送を捉える。強度I = (1–5) × 10^19 W cm^−2、焦点半径数ミクロンのレーザーによって生成された相対論的電子ビームの、ほぼ固体密度の炭素ターゲット内部での伝播を考える。抵抗加熱された背景プラズマからの電子熱輸送は、約1ピコ秒後にオーム加熱と競合するのに十分な強さとなる。熱流がプラズマ温度に及ぼす影響は、数ピコ秒を超える時間スケールでの抵抗性磁場生成を変化させるのに十分である。これには、ビーム入射点付近での磁場消去と、収束磁場の再出現が含まれる。背景電子は数ピコ秒後に弱く磁化され、磁化輸送効果が背景プラズマ温度の時間発展と高速電子フィラメントの長期的な時間発展を有意に変化させるのに十分となる。電子磁化の時間発展に関する実用的な評価式を提示し、それがシミュレーション結果と一致することを示す。この状況では、輸送に対する非局所補正が最大20%に達することが見出された。

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