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Current profile tailoring using localized electron cyclotron heating in highly elongated TCV plasmas

Y. Camenen, F. Hofmann, A. Pochelon, A. Scarabosio, S. Alberti, G. Arnoux, P. Blanchard, S. Coda, T.P. Goodman, M.A. Henderson2007年被引用 18Nuclear FusionIF 3出版社

Radially localized electron cyclotron heating (ECH) at the 2nd harmonic (X2) is used to tailor the current profile through the modification of the temperature, and hence conductivity, profiles. The optimal conditions for current profile broadening are investigated and applied to decrease the plasma internal inductance at constant plasma current. Highly elongated plasmas are thus created at low current, where they are vertically unstable with peaked Ohmic current profiles, using active current profile broadening by far off-axis X2 ECH to ensure the vertical stability of the plasma. Central 3rd harmonic (X3) ECH is also applied and its impact on the current profile is described. The magnetohydrodynamic activity and in particular the replacement of the sawtooth by a multi-harmonics mode, resonant on the q = 1 surface and observed at high density and low internal inductance, is investigated.

日本語訳

半径方向に局在した電子サイクロトロン加熱(ECH)の第2高調波(X2)を用いて、温度分布、ひいては電気伝導度分布の変更を通じて電流分布を調整する。電流分布の平坦化のための最適条件を調査し、プラズマ電流一定の条件下で内部インダクタンスを低減するために適用する。これにより、オーミック電流分布がピーク状であるために低電流では垂直方向に不安定となる高伸長プラズマを、遠軸X2 ECHによる能動的な電流分布平坦化によって垂直安定性を確保しつつ生成する。また、中心部での第3高調波(X3)ECHも適用し、その電流分布への影響を記述する。さらに、高密度かつ低内部インダクタンス条件下で観測される、q = 1 面上で共鳴する多高調波モードによる鋸歯状振動の置換を含む磁気流体力学的活動について調査する。

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Electron cyclotron heatingTCVCurrent profile
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