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Experimental study on plasma characteristics in the extraction region of a high-power RF negative ion source based on electrostatic probe

Xufeng Peng, Yongjian Xu, Yahong Xie, Jianglong Wei, Yufan Li, Yuwen Yang, Bo Liu, Junwei Xie, Bin Wu2024年10月Plasma Physics and Controlled FusionIF 2.2出版社

The plasma characteristics of the extraction region in high-power RF negative ion source have a significant impact on the production and extraction of negative hydrogen ions. This study utilized electrostatic probe to investigate the effect of RF power, source pressure, magnetic filter field and bias voltage on the plasma parameters of the extraction region (without cesium), and also studied the variation of plasma parameters with position and time. The results indicate that as RF power increases, the plasma density in the extraction region significantly rises, but it also leads to an increase in the electron temperature () of the extraction region (which increases the loss of negative hydrogen ions); increasing the source pressure can effectively increase the electron density () in the extraction region and reduce as expected; increasing the magnetic filter field can effectively reduce the in the extraction region, but after the plasma grid current exceeds 1900 A, the change in is not significant; although increasement of the bias voltage can effectively suppress the in the extraction region, it causes to rise; moreover, the distribution of plasma parameters in the extraction region is relatively uniform; in addition, the variation of plasma parameters with time is not obvious. These findings not only deepen the understanding of the physical mechanisms of plasma behavior in the extraction region of negative ion sources, but also provide important theoretical and experimental bases for the optimization of high-power RF negative ion sources.

日本語訳

高出力RF負イオン源における引き出し領域のプラズマ特性は、負水素イオンの生成と引き出しに大きな影響を与える。本研究では、静電プローブを用いて、RFパワー、ソース圧力、磁気フィルター場、バイアス電圧が引き出し領域のプラズマパラメータ(セシウムなし)に及ぼす影響を調査し、また、プラズマパラメータの位置および時間による変化を研究した。結果は、RFパワーの増加に伴い、引き出し領域のプラズマ密度は有意に上昇するが、それは同時に引き出し領域の電子温度()の上昇も引き起こす(これは負水素イオンの損失を増加させる);ソース圧力を増加させると、予想通り、引き出し領域の電子密度()を効果的に増加させ、()を低下させることができる;磁気フィルター場を増加させると、引き出し領域の()を効果的に低下させることができるが、プラズマグリッド電流が1900 Aを超えた後は、()の変化は有意ではない;バイアス電圧の増加は引き出し領域の()を効果的に抑制できるが、()を上昇させる;さらに、引き出し領域におけるプラズマパラメータの分布は比較的均一である;加えて、プラズマパラメータの時間による変化は顕著ではない。これらの発見は、負イオン源の引き出し領域におけるプラズマ挙動の物理メカニズムの理解を深めるだけでなく、高出力RF負イオン源の最適化のための重要な理論的および実験的基盤を提供するものである。

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Ion sourceNegative ionNegative ion source
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