The influence of ion flux during plasma-enhanced chemical vapor deposition on the sp3/sp2 ratio of diamond-like carbon deposited on alumina particlesAvailable to Purchase
Junping Zhao, Zhengjie An, Hongru Zhang, Chengyan Han, Jinchu Chen, Shuya Cao, Xudong Zhao2026年8月Physics of PlasmasIF 2.2出版社