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Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam

Jiwon Jung, Min-Seok Kim, Junyoung Park, Chang-Min Lim, Tae-Wung Hwang, Beom-Jun Seo, Chin-Wook Chung2023年Physics of PlasmasIF 2.2 出版社

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Electron beams Inductively coupled plasma

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