Voltage waveform control of an embedded focus ring electrode to improve edge plasma uniformity and ion incidence angle in capacitively coupled RF dischargesAvailable to Purchase

Experimental and numerical characterization of a radio-frequency plasma source with a DC-grounded electrode configuration using a quarter-wavelength filter

RFA DC operation for ion temperature fluctuation measurements in a configuration without the impact of the secondary electron emission

The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials

Electron heating in multiple-frequency capacitive discharges