Physical characterisation of dry etching plasmas used in semiconductor fabrication

V G I Deshmukh, T I Cox1988年Plasma Physics and Controlled FusionIF 2.2 出版社

Dry etching using gaseous plasmas is an essential technique in the delineation of ultrafine features required for integrated circuits in today's silicon based technologies. The authors give examples of the use of dry etching and describes a selection of diagnostic tools that are proving useful in elucidating the underlying physics and chemistry of plasma based etching methods.

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