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Real-time reconstruction and control of pedestal-top electron density using RMP and gas puff at KSTAR

Minseok Kim, SangKyeun Kim, Andrew Rothstein, Peter Steiner, Keith Erickson, Young-Ho Lee, Hyunsun Han, Sang-hee Hahn, June-woo Juhn, Boseong Kim2026年1月Plasma Physics and Controlled FusionIF 2.2出版社

We report the experimental results of controlling the pedestal-top electron density by applying resonant magnetic perturbation (RMP) with in-vessel control coils and the main gas puff in the 2024-2025 KSTAR experimental campaign. The density is reconstructed using a parameterized grid and five channels of line-averaged density measured by the two-colored interferometer (TCI). The reconstruction procedure is accelerated by deploying a multi-layer perceptron to run in approximately 120 µ s and is sufficiently fast for real-time control. A proportional-integral controller was adopted, with the controller gains estimated from the system identification procedure. The experimental results demonstrate that the developed controller can follow a dynamic target while exclusively using both actuators. The absolute percentage errors between the electron density at and the target were approximately 1.5% median and a 2.5% average, respectively. The developed controller can even lower the density by using the pump-out mechanism under RMP, and it can follow a more dynamic range of density targets than a single actuator controller. The developed controller will enable experimental scenario exploration within a shot by dynamically setting the density target or maintaining a constant electron density within a discharge.

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kstar高精度(タイトル一致)

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PedestalKSTARResonant magnetic perturbationGas puff

AIによる論文要約

KSTARにおけるRMPとガスパフを用いたペデスタルトップ電子密度のリアルタイム再構成と制御
JAプラズマ制御や核融合研究の学生、研究者、エンジニア。特に実時間フィードバック制御に関心のある方。#核融合 #KSTAR #プラズマ制御 #RMP #電子密度
LLM向け: {"Title": "ペデスタルトップ電子密度の実時間制御", "Authors": "不明", "Research Objective": "ペデスタルトップ…

本論文では、KSTARトカマクにおいて、共鳴磁場摂動(RMP)とガスパフを用いてペデスタルトップの電子密度をリアルタイムで制御した結果を報告します。密度は、2色干渉計の5チャンネルライン平均密度をパラメータ化グリッドで再構成し、多層パーセプトロンにより約120マイクロ秒で高速処理されます。比例積分制御器を採用し、システム同定でゲインを推定しました。実験の結果、目標値に対する絶対誤差の中央値は約1.5%、平均約2.5%と高精度で、RMPのポンプアウト効果により密度を低下させることも可能です。本制御器により、放電中に密度目標を動的に変更するなど、実験シナリオの柔軟な探索が可能になります。

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