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A high voltage pulse power supply for metal plasma immersion ion implantation and deposition

M. C. Salvadori, F. S. Teixeira, W. W. R. Araújo, L. G. Sgubin, N. S. Sochugov, R. E. Spirin, I. G. Brown2010年Review of Scientific InstrumentsIF 1.6出版社

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Power supplyIon implantation
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