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A comparison of the impact of central ECRH and central ICRH on the tungsten behaviour in ASDEX Upgrade H-mode plasmas

C. Angioni, M. Sertoli, R. Bilato, V. Bobkov, A. Loarte, R. Ochoukov, T. Odstrcil, T. Pütterich, J. Stober, The ASDEX Upgrade Team2017年被引用 40Nuclear FusionIF 3出版社

A comparison of the impact of additional central electron cyclotron resonance heating (ECRH) and ion cyclotron resonance heating (ICRH) on the behaviour of the tungsten (W) density in the core of H-mode plasmas heated with neutral beam injection (NBI) is performed in ASDEX Upgrade. Both localized and broad profiles of the power density of the ECRH have been obtained, where broad profiles reproduce the profile shape of the ICRH power density, which is applied with a hydrogen minority heating scheme. In contrast to ECRH, which produces direct electron heating only, ICRH eventually heats both electrons and ions in almost equal fractions. It is found that both additional RF heating systems reduce the peaking of the W density profile with increasing central RF heating power. Approximately the same values of W density peaking are obtained when the same values of electron heating are produced by the two RF heating systems, which implies that less total heating power is required with ECRH than with ICRH to reduce the W density peaking. A related modelling activity shows that an important ingredient to explain the experimentally observed trend is the variation of the turbulent W diffusion as a function of the electron to ion heat flux ratio. Additional effects are connected with the more favorable W neoclassical transport convection in the presence of ICRH, produced by the combination of stronger central ion temperature gradients and the impact of the H minority on the W poloidal density asymmetry.

日本語訳

ASDEX Upgradeにおいて、中性粒子ビーム入射(NBI)で加熱されたHモードプラズマのコアにおけるタングステン(W)密度の挙動に対する、追加の電子サイクロトロン共鳴加熱(ECRH)とイオンサイクロトロン共鳴加熱(ICRH)の影響の比較が行われた。ECRHの電力密度の局所的及びブロードな分布の両方が得られ、ブロードな分布は、水素マイノリティ加熱スキームで印加されるICRH電力密度の分布形状を再現する。電子のみを直接加熱するECRHとは対照的に、ICRHは最終的には電子とイオンの両方をほぼ等しい割合で加熱する。両方の追加RF加熱システムは、中心RF加熱電力の増加に伴ってW密度分布のピーキングを低減することが見出された。2つのRF加熱システムによって同じ値の電子加熱が生成される場合、ほぼ同じW密度ピーキングの値が得られ、これはW密度ピーキングを低減するためにECRHではICRHよりも少ない総加熱電力が必要であることを示唆する。関連するモデリング活動により、実験的に観測された傾向を説明する重要な要素は、電子対イオン熱流束比の関数としての乱流W拡散の変化であることが示された。追加の効果は、より強い中心イオン温度勾配とWポロイダル密度非対称性に対するHマイノリティの影響の組み合わせによって生成される、ICRH存在下でのより有利なW新古典輸送対流に関連している。

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asdex-upgrade高精度(タイトル一致)

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TungstenASDEXASDEX UpgradeH-modeIon cyclotron heatingElectron cyclotron heating
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