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Analytic dispersion relation for resistive wall modes in rotating plasmas by generalized matching theory

J. Shiraishi, S. Tokuda2011年被引用 5Nuclear FusionIF 3出版社

Analytic dispersion relation is derived for resistive wall modes (RWMs) in rotating plasmas, which gives the growth rate and the real frequency. The given parameters are wall information (radius, thickness and volume resistivity) and equilibrium quantities at a plasma surface and at a singular point of the generalized Newcomb equation, which is an inertia-less linearized ideal magnetohydrodynamic equation with equilibrium rotation. Derivation of the dispersion relation is based on the generalized matching theory proposed by the present authors, which exploits the inner 'region' with finite width. It is found that the RWM stability is strongly affected by rotation shear, not at the rational surface, but at the singular point of the generalized Newcomb equation.

日本語訳

回転プラズマ中の抵抗性壁モード(RWM)に対する分散関係を導出し、成長率と実周波数を求める。与えられるパラメータは、壁の情報(半径、厚さ、体積抵抗率)と、プラズマ表面および一般化ニューカム方程式の特異点における平衡量である。一般化ニューカム方程式は、平衡回転を伴う無慣性線形化磁気流体力学方程式である。分散関係の導出は、本著者らが提案した一般化マッチング理論に基づいており、有限幅を持つ内部「領域」を利用する。RWMの安定性は、有理面ではなく、一般化ニューカム方程式の特異点における回転シアによって強く影響を受けることが見出された。

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Resistive wall modeRotating plasma
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