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Formation of electron internal transport barriers by highly localized electron cyclotron resonance heating in the large helical device

T Shimozuma, S Kubo, H Idei, Y Yoshimura, T Notake, K Ida, N Ohyabu, I Yamada, K Narihara, S Inagaki2003年Plasma Physics and Controlled FusionIF 2.2出版社

Internal transport barriers with respect to electron thermal transport (eITB) were observed in the large helical device, when the electron cyclotron resonance heating (ECH) power was highly localized on the centre of a plasma sustained by neutral beam injection. The eITB is characterized by a high central electron temperature of 6–8 keV with an extremely steep gradient, as high as 55 keV m−1 and a low electron thermal diffusivity within a normalized average radius ρ≈0.3 as well as by the existence of clear thresholds for the ECH power and plasma collisionality.

日本語訳

大型ヘリカル装置において、中性粒子ビーム入射によって維持されたプラズマの中心部に電子サイクロトロン共鳴加熱(ECH)電力が高度に局在化されたとき、電子熱輸送に関する内部輸送障壁(eITB)が観測された。このeITBは、6~8 keVの高い中心電子温度と、55 keV m⁻¹にも達する極めて急峻な勾配、ならびに規格化平均半径ρ≈0.3以内での低い電子熱拡散係数を特徴とし、さらにECH電力とプラズマ衝突頻度に対する明確な閾値の存在によって特徴づけられる。

装置

lhd高精度(タイトル一致)

wiki

Electron cyclotron heatingTransport barrierCyclotron resonanceHelical deviceElectron cyclotron resonanceInternal transport barrier
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